2022年第83回応用物理学会秋季学術講演会

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一般セッション(口頭講演)

21 合同セッションK「ワイドギャップ酸化物半導体材料・デバイス」 » 21.1 合同セッションK 「ワイドギャップ酸化物半導体材料・デバイス」

[20p-B203-1~22] 21.1 合同セッションK 「ワイドギャップ酸化物半導体材料・デバイス」

2022年9月20日(火) 13:00 〜 19:00 B203 (B203)

尾沼 猛儀(工学院大)、西中 浩之(京都工繊大)

13:00 〜 13:15

[20p-B203-1] Impact of Au surfactant on composition and optical properties of gallium oxysulfide films

〇(D)Weiqi Zhou1、Takuto Soma1、Akira Ohtomo1 (1.Tokyo Tech)

キーワード:gallium oxide, PLD, sulfur substitution

β-Ga2O3 is a wide bandgap semiconductor that is expected to be applied for the next-generation power devices. However, the lack of p-type materials largely restricts its applicability. To realize the Ga2O3-based p-type materials, our group proposed a N-doping method by using pulsed-laser deposition (PLD) technique and succeed in growing β-Ga2O3 films with high N concentration and high crystallinity. Due to the deep acceptor level of N, however, p-type behavior has not been found yet. We also investigated an approach for activation of N acceptors: making valence band maximum shallower by substituting O atoms with isovalent S atoms. In this study, we examine roles of a Au surfactant in the growth of gallium oxysulfide films and find enhanced S incorporation probably due to Au-thiol bonding.