[20p-C304-1~14] 4.1 Plasmonics and Nanophotonics

▼ [20p-C304-7] Loss control with annealing and lattice Kerker effect in silicon metasurfaces

〇Liu Libei¹, Feifei Zhang¹, Shunsuke Murai¹, Katsuhisa Tanaka¹ (1.Kyoto Univ.)

Keywords:photonics, metasurface

We verify a drastic improvement of the optical performance of sputter-originated amorphous (a-) Si metasurfaces via post-annealing. A directional narrowband near-perfect absorption (quality-factor ~ 60) due to the lattice Kerker effect, which is hidden in the as-made metasurface, emerges after annealing. The numerical multipole expansion analysis gives the physical background of this observation. This refinement of a-Si metasurfaces by post-annealing paves the simple and robust way of realizing thrilling optical and opto-electrical applications, such as detectors and filters.