[21a-C106-1~10] 12.1 Fabrications and Structure Controls

[21a-C106-4] Preparation of Thin Film Ionic Diodes from Photo-Oxidized Nanoporous SiO₂ Films

〇(M1)Narumi Kumakura¹, Yuya Ishizaki^1,2, Shunsuke Yamamoto¹, Masaya Mitsuishi¹ (1.Tohoku Univ., 2.Rikkyo Univ.)

Keywords:ionic diodes, spin-coat, layer-by-layer films

Nanoporous (NP) SiO₂ thin films with cylinder-like nanochannels were prepared from silsesquioxane-containing block copolymer films by thermal annealing and a subsequent photo-oxidation process. Thin-film ionic diodes with surface charge asymmetry were fabricated by combination of NP SiO₂ films and polyelectrolyte layer-by-layer nanofilms on anodic aluminum oxide support substrates. Ionic diode characteristics were investigated by current–voltage measurements.