[21p-A404-1~17] 3.11 Nanoscale optical science and near-field optics (formerly 3.12)

[21p-A404-6] Nano hole array structure optimization for deep UV plasmon excitation and to apply photoelectron emission

〇(D)Hirofumi Morisawa¹, Atsushi Ono¹, Wataru Inami¹, Yoshimasa Kawata¹ (1.Shizuoka Univ.)

Keywords:Nanophotonics, Plasmonics, Photoelectric conversion

We report the optimization of aluminum nanohole array structures for the excitation of deep-ultraviolet surface plasmons and to apply to photoelectron emission. The structural parameters of the nano hole array were optimized by electromagnetic field analysis, and the structures were fabricated by nanosphere lithography. Optimization of etching time enabled excitation of deep UV surface plasmon resonance. The photoelectron electron emission efficiency was found to be enhanced by a factor of 3, demonstrating the high efficiency of photoelectric conversion by deep UV surface plasmon resonance.