Investigation of pinhole suppression on selective growth mask during quantum shell device growth

Shiori Yamamura; Nanami Nakayama; Yukimi Jinno; Sae Katsuro; Mizuki Takahashi; Yuki Yamanaka; Ayaka Shima; Shiori Ii; Soma Inaba; Tetsuya Takeuchi; Motoaki Iwaya; Satoshi Kamiyama

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[21p-B201-1~16] 15.4 III-V-group nitride crystals

Wed. Sep 21, 2022 1:30 PM - 6:00 PM B201 (B201)

Ryuji Katayama(Osaka Univ.), Mitsuru Funato(Kyoto Univ.), Kanako Shojiki(Mie Univ.)

3:30 PM - 3:45 PM

△ [21p-B201-8] Investigation of pinhole suppression on selective growth mask during quantum shell device growth

〇Shiori Yamamura¹, Nanami Nakayama¹, Yukimi Jinno¹, Sae Katsuro¹, Mizuki Takahashi¹, Yuki Yamanaka¹, Ayaka Shima¹, Shiori Ii¹, Soma Inaba¹, Tetsuya Takeuchi¹, Motoaki Iwaya¹, Satoshi Kamiyama¹ (1.Meijo University)

Keywords:nanowire, selective area growth, pin hole

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