14:15 〜 14:30
▲ [21p-C304-3] A strong electro-optically active ferroelectric thin-film integrated on silicon
キーワード:ferroelectric thin-film on insulator
In this abstract, a strong electro-optically active ferroelectric thin-film of 81 pm/V was successfully integrated on silicon wafer. This result is an important step toward a large-scale ferroelectric thin-film photonic integration, allowing for denser integration and lower power consumption.