[22a-P04-1~14] 8 Plasma Electronics(Poster)

[22a-P04-10] Influence of atmospheric plasma irradiation on EC durability of InN thin film

〇Haruto Watanabe¹, Keita Miyasaka², Yasusi Inoue^1,2, Osamu Takai³ (1.Dept. Eng. Chiba Inst. Technol., 2.Grad. Sch. Eng. Chiba Inst. Technol., 3.Kanto Gakuin Univ.)

Keywords:reactive deposition, oblique incidence deposition, electrochromic

This work investigated the effects of atmospheric air plasma (AAP) irradiation, which can enhance oxidizing reaction at low temperature, on electrochromic (EC) durability of InN thin films. The InN films were deposited on ITO-coated glass substrates by reactive evaporation with glancing-angle deposition scheme at the substrate angle of 85 degree, which realized isolated nanocolumnar structures. The EC durability was improved by the AAP irradiation.