[22p-C202-1~12] 6.4 Thin films and New materials

△ [22p-C202-9] Effect of Sputtering in TiO₂ Thin Film deposited by Combination Coating Method

〇(M1)Kosuke Endo¹, Hiroshi Murotani¹, Takayaki Matsudaira² (1.Tokai Univ., 2.SHINCRON co.,Ltd)

Keywords:optical thin film, titanium oxide

In this laboratory, we have developed combination coating method in which the EB deposition and DC pulse sputtering methods are installed in the same vacuum vessel and operated simultaneously. In a previous study, we succeeded in reducing the refractive index of SiO₂, MgF₂, and Al₂O₃ optical thin films by this method, but it was suggested that crystalline films may be more difficult to reduce the refractive index. To investigate this possibility, we would like to deposit TiO₂ films, which can be both amorphous and crystalline, using this method. As a basic study, we investigated the effect of sputtering on TiO₂ thin film in this method.