4:45 PM - 5:00 PM
[23p-B203-13] Dielectric properties of atomic layered materials
Keywords:atomic layered material, dielectric property
Using the density functional theory, we investigated the dielectric properties of bilayer hexagonal boron nitride (hBN) and MoS2 in terms of interlayer stacking arrangement. Our calculation demonstrated that the dielectric properties strongly depend on the stacking arrangements and constituent elements. Polarization in a bilayer hBN with AB stacking causes the potential difference of 120 mV between upper and lower layers, while the polarization is absent for the hBN with twisted stacking.