Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[25p-F307-1~16] 6.4 Thin films and New materials

Fri. Mar 25, 2022 1:30 PM - 6:00 PM F307 (F307)

Katsuhisa Tanaka(Kyoto Univ.), Tetsuo Tsuchiya(AIST)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

△ [25p-F307-1] Heat Resistant Black Insulative Al-Doped Ag-Fe-O Thin Films For Touch Panel Displays

〇(DC)Mina Yamaguchi¹, Akihiro Ishii¹, Itaru Oikawa¹, Yusuke Yamazaki², Masaaki Imura², Hitoshi Takamura¹ (1.Tohoku Univ., 2.Nippon Electric Glass)

1:45 PM - 2:00 PM

▼ [25p-F307-2] Physical vapor deposition of conductive metal–organic framework thin film

〇(D)Seoungmin Chon¹, Ryo Nakayama¹, Shunta Iwamoto¹, Ryota Shimizu¹, Taro Hitosugi¹ (1.Tokyo Tech)

2:00 PM - 2:15 PM

△ [25p-F307-3] La_n+1Ni_nO_3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

〇Yuki Goto¹, Shohei Hisatomi¹, Tomoaki Oga¹, Satoru Kaneko^2,1, Mamoru Yoshimoto¹, Akifumi Matsuda¹ (1.TokyoTech, 2.KISTEC)

2:15 PM - 2:30 PM

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO₂
(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

〇(D)Kaidong Wang¹, Kazunori Nishio¹, Koji Horiba², Miho Kitamura², Kurei Edamura¹, Daisuke Imazeki¹, Ryo Nakayama¹, Ryota Shimizu¹, Hiroshi Kumigashira^2,3, Taro Hitosugi¹ (1.Tokyo Tech, 2.PF-KEK, 3.Tohoku Uni.)

2:30 PM - 2:45 PM

△ [25p-F307-5] Fabrication of La_1-xBa_xF_3-x epitaxial thin films using CF₄-assisted sputtering

〇Keisuke Fukatsu¹, Ryota Shimizu¹, Xin Dai¹, Shigeru Kobayashi¹, Kazunori Nishio¹, Taro Hitosugi¹ (1.Tokyo Tech)

2:45 PM - 3:00 PM

△ [25p-F307-6] Tunable Cr_1+δTe₂ films hosting skyrmion from frustrated ferrimagnetic background

〇Yuita Fujisawa¹, Markel Pardo-Almanza¹, Kohei Yamagami¹, C.H. Hsu², F.C. Chung², Yoshinori Okada¹ (1.OIST, 2.National Sun Yat-sen Univ.)

3:15 PM - 3:30 PM

△ [25p-F307-7] Film growth of perovskite hydride BaLiH₃ using infrared laser evaporation

〇(B)Erika Fukushi¹, Atsuo Kazama¹, Kota Munefusa¹, Hiroyuki Oguchi¹ (1.Shibaura Tech.)

3:30 PM - 3:45 PM

△ [25p-F307-8] Film growth of Group 1 and Group 2 Metal Hydrides using infraed laser deposition

〇(B)Kota Munefusa¹, Atsuo Kazama¹, Erika Fukushi¹, Hiroyuki Oguchi¹ (1.Shibaura Inst.)

3:45 PM - 4:00 PM

△ [25p-F307-9] Evaluation of LiBH₄ Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

〇(B)Kei Iwasaki¹, Keiichiro Iso¹, Atsuo Kazama¹, Hiroyuki Oguchi¹ (1.Shibaura Tech.)

4:00 PM - 4:15 PM

△ [25p-F307-10] Improvement in flatness of LiBH₄ films by substrate surface modification

〇(M1)Keiichiro Iso¹, Iwasaki Kei¹, Kazama Atsuo¹, Oguchi Hiroyuki¹ (1.Shibaura Inst.)

4:15 PM - 4:30 PM

△ [25p-F307-11] Film Growth of LiBH₄ Using Ionic Liquid-Mediated Method

〇(B)Takumi Tozawa¹, Atsuo Kazama¹, Shingo Maruyama², Yuji Matsumoto², Hiroyuki Oguhi¹ (1.Shibaura Tech., 2.Tohoku Univ.)

4:45 PM - 5:00 PM

△ [25p-F307-12] Thin-film growth and work-function characterizations of group IV transition-metal hydrides and nitrides

〇(M2)Ziyang Cao¹, Ryoichiro Hayashi¹, Takuto Soma¹, Akira Ohtomo^1,2 (1.Tokyo Tech., 2.MCES.)

5:00 PM - 5:15 PM

▼ [25p-F307-13] Growth of Uniaxially Oriented Nickel Aluminum Superalloy Films for Spectroscopic Infrared Emitters

〇(D)PhuocToan Tran^1,2, Duc Thien Ngo^1,2, Tadaaki Nagao^1,2 (1.NIMS, 2.Hokkaido University)

5:15 PM - 5:30 PM

△ [25p-F307-14] Hydrophilicity evaluation of low refractive index SiO<sub>2 </sub>Optical Thin Films by Electron Beam and Sputtering Evaporation part3

〇(M1)Mutsuki Ito¹, Takayuki Matsudaira², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON Co.,Ltd.)

5:30 PM - 5:45 PM

△ [25p-F307-15] Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and
Electron Beam Evaporation

〇(M1)Hiroyasu Kato¹, Takayuki Matudaira², Hiroshi Murotani¹ (1.Grad.Sch.of Eng.,Tokai Univ., 2.SHINCRON Co.,Ltd)

5:45 PM - 6:00 PM

△ [25p-F307-16] Basic Research on the Application of CeO_²Films to Optical Sensors

〇(M2)Haruna Suzuki¹, Hiroshi Murotani¹ (1.Tokai Univ.)

Session information

[25p-F307-1~16] 6.4 Thin films and New materials

△ [25p-F307-1] Heat Resistant Black Insulative Al-Doped Ag-Fe-O Thin Films For Touch Panel Displays

▼ [25p-F307-2] Physical vapor deposition of conductive metal–organic framework thin film

△ [25p-F307-3] La_n+1Ni_nO_3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO₂
(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

△ [25p-F307-5] Fabrication of La_1-xBa_xF_3-x epitaxial thin films using CF₄-assisted sputtering

△ [25p-F307-6] Tunable Cr_1+δTe₂ films hosting skyrmion from frustrated ferrimagnetic background

△ [25p-F307-7] Film growth of perovskite hydride BaLiH₃ using infrared laser evaporation

△ [25p-F307-8] Film growth of Group 1 and Group 2 Metal Hydrides using infraed laser deposition

△ [25p-F307-9] Evaluation of LiBH₄ Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

△ [25p-F307-10] Improvement in flatness of LiBH₄ films by substrate surface modification

△ [25p-F307-11] Film Growth of LiBH₄ Using Ionic Liquid-Mediated Method

△ [25p-F307-12] Thin-film growth and work-function characterizations of group IV transition-metal hydrides and nitrides

▼ [25p-F307-13] Growth of Uniaxially Oriented Nickel Aluminum Superalloy Films for Spectroscopic Infrared Emitters

△ [25p-F307-14] Hydrophilicity evaluation of low refractive index SiO<sub>2 </sub>Optical Thin Films by Electron Beam and Sputtering Evaporation part3

△ [25p-F307-15] Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and
Electron Beam Evaporation

△ [25p-F307-16] Basic Research on the Application of CeO_²Films to Optical Sensors

Authenticate

Session information

[25p-F307-1~16] 6.4 Thin films and New materials

△ [25p-F307-1] Heat Resistant Black Insulative Al-Doped Ag-Fe-O Thin Films For Touch Panel Displays

▼ [25p-F307-2] Physical vapor deposition of conductive metal–organic framework thin film

△ [25p-F307-3] Lan+1NinO3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO2(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

△ [25p-F307-5] Fabrication of La1-xBaxF3-x epitaxial thin films using CF4-assisted sputtering

△ [25p-F307-6] Tunable Cr1+δTe2 films hosting skyrmion from frustrated ferrimagnetic background

△ [25p-F307-7] Film growth of perovskite hydride BaLiH3 using infrared laser evaporation

△ [25p-F307-8] Film growth of Group 1 and Group 2 Metal Hydrides using infraed laser deposition

△ [25p-F307-9] Evaluation of LiBH4 Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

△ [25p-F307-10] Improvement in flatness of LiBH4 films by substrate surface modification

△ [25p-F307-11] Film Growth of LiBH4 Using Ionic Liquid-Mediated Method

△ [25p-F307-12] Thin-film growth and work-function characterizations of group IV transition-metal hydrides and nitrides

▼ [25p-F307-13] Growth of Uniaxially Oriented Nickel Aluminum Superalloy Films for Spectroscopic Infrared Emitters

△ [25p-F307-14] Hydrophilicity evaluation of low refractive index SiO<sub>2 </sub>Optical Thin Films by Electron Beam and Sputtering Evaporation part3

△ [25p-F307-15] Low Refractive Index Al2O3 Optical Thin Films by Sputtering andElectron Beam Evaporation

△ [25p-F307-16] Basic Research on the Application of CeO2 Films to Optical Sensors

Authenticate

△ [25p-F307-3] La_n+1Ni_nO_3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO₂
(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

△ [25p-F307-5] Fabrication of La_1-xBa_xF_3-x epitaxial thin films using CF₄-assisted sputtering

△ [25p-F307-6] Tunable Cr_1+δTe₂ films hosting skyrmion from frustrated ferrimagnetic background

△ [25p-F307-7] Film growth of perovskite hydride BaLiH₃ using infrared laser evaporation

△ [25p-F307-9] Evaluation of LiBH₄ Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

△ [25p-F307-10] Improvement in flatness of LiBH₄ films by substrate surface modification

△ [25p-F307-11] Film Growth of LiBH₄ Using Ionic Liquid-Mediated Method

△ [25p-F307-15] Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and
Electron Beam Evaporation

△ [25p-F307-16] Basic Research on the Application of CeO_²Films to Optical Sensors