[22p-D214-1~15] 9.5 新機能材料・新物性

▼ [22p-D214-8] Strain Tuning of Proton-Induced Resistance Modulation in NdNiO₃ Thin Film

〇(D)Umar Sidik¹、Azusa N. Hattori¹、Ken Hattori²、Musa Alaydrus³、Ikutaro Hamada³、Liliany N. Pamasi²、Hidekazu Tanaka¹ (1.SANKEN, Osaka Univ.、2.Grad. Sch. of Sci. and Tech., NAIST、3.Grad. Sch. of Eng., Osaka Univ.)

キーワード：perovskite rare-earth nickelate thin film, proton doping-induced resistance modulation, Strain-regulated tuning

In this work, hydrogenation and corresponding resistance modulation were systematically studied as a function of strain in NdNiO₃ thin films. We demonstrated a fine tuning of proton doping is possible by regulating the strain. In the presentation, a reciprocal space mapping analysis will also be presented, delivering an understanding of the effect of strain-controlled perovskite structure on proton doping. In addition, we will show how the compressive strain can effectively enhance the proton diffusion by reducing the activation energy via the first principles calculations.