[22p-E105-1~18] 8.1 Plasma production and diagnostics

[22p-E105-1] Increase in plasma density by applying negative pulse bias voltage on a substrate stage in an electron cyclotron resonance plasma

〇Ikumi Hamaguchi¹, Hansin Bae¹, Kensuke Sasai², Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1.Nagoya Univ., 2.cLPS, Nagoya Univ., 3.NIFS)

Keywords:plasma, electron cyclotron resonance plasma