[23a-E103-1~10] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[23a-E103-9] Optical Emission Spectroscopy of Deep Oscillation Magnetron Sputtering: Ion-Confinement Effect

〇Eisuke Yokoyama¹, Youhei Ono¹, Daiki Sakamoto¹, Shoudai Takayama¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Masahide Tona², Hiroaki Yamamoto², Keizou Tsukamoto², Kiyokazu Huke³, Keijiro Ohshimo⁴, Fuminori Misaizu⁴ (1.Tokyo Polytech Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)

Keywords:pulsed sputtering, optical emission spectroscopy, deep oscillation magnetron sputtering

In high power pulsed magnetron sputtering (HPPMS), which is one of the ionization physical vapor deposition method, deep oscillation magnetron sputtering (DOMS) applying a pulsed power that consists of comb-like waveform has attracted attention as a diamond-like carbon coating method with arc-free conditions. In this study, we investigated time-resolved and position-resolved measurements for optical emission of DOMS plasma in order to get information on the atomic and sputtering processes, which are the keys to the control of sputtering deposition in DOMS. Based on results of the OES measurements and electromagnetic analysis of a plasma source, the relationship between the OES spectrum of DOMS plasma and the ion confinement effect due to the magnetic trap in front of metal target will be discuss in presentation.