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[23p-E106-3] Fabrication of tetragonal zircon BiVO4 photoelectrode by sputtering method
Keywords:photoelectrode, bismuth vanadate, Sputtering
In this work, we report the fabrication of bismuth vanadate (BiVO4) photoelectrodes by sputtering method. among the three types of BiVO4 crystal structures, monoclinic scheelite (m-s) and tetragonal zircon (t-z) structures were selectively fabricated by adjusting the deposition parameters, i.e., substrate temperature and RF power. The three types of BiVO4 crystal structures, monoclinic scheelite (m-s) and tetragonal zircon (t-z), were selectively fabricated by adjusting the deposition parameters, substrate temperature and RF power.