[23p-E304-1~6] Research trend of laser processing technology incorporated with artificial intelligence

[23p-E304-5] Prediction of electrical properties of poly-Si TFTs with artificial intelligence

〇Hiroshi Ikenoue^1,2, Takayuki Kurashige¹, Takahiro Nagano¹, Keita Katayama¹, Yoshiaki Kakimoto², Daisuke Nakamura¹, Tetsuya Goto³ (1.ISEE, Kyushu Univ., 2.Dept. of GPI, Kyushu Univ., 3.Tohoku Univ.)

Keywords:AI analysis, Laser Annealing, Semiconductor device

Artificial Intelligence (AI) analyses in semiconductor device fabrication are applied to complex processes with many control parameters. Thin film transistors (TFTs) can be formed on insulating films with low heat resistance such as interconnect layers of integrated circuits and glass substrates for display manufacturing. These manufacturing technologies have been developed along with the development of low temperature technologies by laser annealing. In this study, we focus on poly-Si TFTs and estimate the TFT electrical propertiess by deep learning of the optical microscope images of the poly-Si thin film surfaces after laser annealing.