[24a-E102-1~10] 17.3 Layered materials

△ [24a-E102-6] Zr_xHf_1-xS₂ Alloy Film Formation by RF Magnetron Sputtering Co-deposition

〇Shusei Hanafusa¹, Yusuke Hibino^2,4, Ryo Yokogawa^1,4, Hitoshi Wakabayashi³, Atsushi Ogura^1,4 (1.Meiji Univ., 2.Sasebo College., 3.Tokyo Tech., 4.MREL)

Keywords:Alloy, Sputtering

Transition metal dichalcogenides (TMDs) are two-dimensional layered materials that are expected to be applied to various devices. We have focused on ZrS₂ and HfS₂, which have high mobility in the ultrathin film, and have been challenging the deposition of Zr_xHf_1-xS₂ alloys expecting to modulate the physical properties. On the other hand, since both ZrS₂ and HfS₂ are chemically unstable and easily oxidized, there are still no reports of alloy films. In this study, we report the results of ZrHfS₂ alloy film deposition by co-sputtering using ZrS₂ and metal Hf targets.