3:45 PM - 4:00 PM
[24p-D114-10] Effects of gas pressure and substrate position on deposition characteristics of a-C:H films deposited by plasma CVD method
Keywords:hydrogenated amorphous carbon, carbon nano particles
Oral presentation
8 Plasma Electronics » 8.3 Plasma nanotechnology
Thu. Mar 24, 2022 1:00 PM - 4:15 PM D114 (D114)
Takeshi Kitajima(National Defence Academy), Manabu Tanaka(Kyushu Univ.)
3:45 PM - 4:00 PM
Keywords:hydrogenated amorphous carbon, carbon nano particles