1:00 PM - 1:15 PM
[26p-E202-1] Effect of HCl support on the α-Ga2O3 thin films fabrication
Keywords:alpha Gallium Oxide, mist CVD
We report on the difference in film quality of α-Ga2O3 thin films prepared with HCl support by mist CVD.
Oral presentation
21 Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
Sat. Mar 26, 2022 1:00 PM - 4:45 PM E202 (E202)
Kohei Sasaki(Novel Crystal Technology), Oshima Yuichi(NIMS)
1:00 PM - 1:15 PM
Keywords:alpha Gallium Oxide, mist CVD