[26p-F308-1~4] 7.3 Micro/Nano patterning and fabrication

[26p-F308-2] Fabrication of self-standing PDMS film with pitch variable grating pattern

Ryusei Nagahama¹, 〇Hiroaki Kawata¹, Akio Mizutani¹, Hisao Kikuta¹, Yoshihiko Hirai¹ (1.Osaka Pref, Univ.)

Keywords:nanoimprint, pitch variable grating, PDMS film

We have developed a process for fabricating a self-standing polydimethylsiloxane (PDMS) film with embedded polystyrene (PS) grating. Since PDMS can be easily expanded, it is expected that the fabricatied PDMS film can be used as a tunable filter because the grating period of PS can be changed by stretching the self-standing PDMS film. The self-standing PDMS film with 4 um pitch embedded PS grating was successfully fabricated although the PDMS film had some PS grating defects. We will fabricate with a submicron-size PS grating.