Noboru Hiwasa

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:00 PM - 4:15 PM

△ [17p-A205-12] The Influence of Fluorocarbon Gas Molecular Structures and their Atomic Compositions in High Aspect SiO₂ Etching

〇Noboru Hiwasa¹, Junji Kataoka¹, Norikatsu Sasao¹, Shuichi Kuboi¹, Daiki Iino¹, Kazuaki Kurihara¹, Hiroyuki Fukumizu¹ (1.KIOXIA Corp.)