5:00 PM - 5:15 PM
△ [17p-A403-15] Evaluation of process damage induced by transparent conductive oxide film deposition
〇(M2)Haruki Kojima1, Tappei Nishihara1,2, Yuta Ito1, Hyunjyu Lee1,5, Kazuhiro Gotoh3, Noritaka Usami3, Tomohiko Hara4, Kyotaro Nakamura4, Yoshio Oshita4, Atsushi Ogura1,5 (1.Meiji Univ., 2.JSPS Research Fellow DC, 3.Nagoya Univ., 4.Toyota Tech. Inst., 5.Meiji Renewable Energy Laboratory)