3:45 PM - 4:00 PM [15p-D209-9] Change in Contact Potential Difference of Reactive Sputter-Deposited Hafnium Nitride Thin Films by Thermal Treatment 〇Tomoaki Osumi1,2, Masayoshi Nagao2, Yasuhito Gotoh1 (1.Kyoto Univ., 2.AIST)