〇Ryosuke Sato^1,2, Rai Kou², Noritsugu Yamamoto², Guangwei Cong², Koji Yamada², Tomohiro Kita¹ (1.Waseda Univ., 2.AIST)

〇Yoshihiro Honda¹, Tomohiro Amemiya² (1.Sony Group Corp., 2.Tokyo Institute of Technology)

〇Kosuke Okahashi¹, Shingo Takano¹, Ryo Shimizu¹, Yuya Yamaguchi², Pham Dat², Naokatsu Yamamoto², Kouichi Akahane², Atsushi Kanno^2,3, Tetsuya Kawanishi^2,4 (1.Sumitomo Osaka Cement. Ltd., 2.NICT, 3.Nagoya Institute of Technology, 4.Waseda University)

〇Hideo Hara¹, Shunsuke Abe¹, Tomoki Joichi¹, Atushi Seki¹, Shin Masuda¹ (1.Advantest Labs, Ltd.)

〇Tadashi Kishimoto¹, Yoshiaki Tsujimoto¹, Kentaro Wakui¹, Mikio Fujiwara¹, Norihiko Sekine¹ (1.NICT)

〇Hideki Ishizuki^1,2, Takunori Taira^1,2 (1.RIKEN SPring8 Center, 2.Inst. Molecular Science)

〇Sodai Watanabe¹, Hiroyuki Ando¹, Taiki Sakaguchi¹, Daisuke Nakamura², Masato Soutome³, Takashi Kondo^2,3, Ichiro Syoji¹ (1.Chuo Univ, 2.Tokyo Univ, 3.RCAST of Tokyo)

〇Hayato Arai¹, Wataru Kobayashi^1,2, Manabu Mitsuhara¹, Takahiko Shindo¹, Fumito Nakajima¹ (1.NTT Device Technology Lab., 2.NTT Device Innovation Center)