The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15p-A301-1~13] 15.6 Group IV Compound Semiconductors (SiC)

Wed. Mar 15, 2023 1:00 PM - 4:45 PM A301 (Building No. 6)

Takeshi Mitani(AIST), Hirokuni Asamizu(ローム)

3:45 PM - 4:00 PM

[15p-A301-10] Hall evaluation of Si-face 3C/4H-SiC heterojunction

Hiroyuki Sazawa1, Shigeyuki Kuboya1, Hitoshi Umezawa1, Tomohisa Kato1, Yasunori Tanaka1 (1.AIST ADPERC)

Keywords:heterojunction, 3C/4H-SiC, two-dimensional hole gas

The Hall characteristic of Si-face 3C/4H-SiC heterojunctions was evaluated in the temperature range of 80-300K. The conductivity type was P-type . The sheet carrier density was measured as about 1.6 x1013cm-2 and did not depend much on temperature. This value is close to 1.35 x1013cm-2, which has been reported as the calculated value of the fixed charge concentration appearing in the polarization of 4H-SiC. From these facts, we speculated that the carriers are two-dimensional hole gases induced at the junction interface by the polarization of 4H-SiC.