[15p-B309-1~19] 8.1 Plasma production and diagnostics

[15p-B309-2] Estimation of Vibrational Temperature of CF B-X System by Optical Emission Spectroscopic Diagnostics

〇Akira Kobayashi¹, Yuya Yamashita¹, Kohaku Sunakawa¹, Kazuma Yoneda¹, Tetsuji Kiyota², Kenta Doi², Atsushi Nezu¹, Hiroshi Akatsuka¹ (1.Tokyo Tech, 2.ULVAC)

Keywords:optical emission spectroscopic measurement, vibrational temperature, CF4/O2 mixed plasma

In CF₄/O₂ plasma, which is frequently used for etching, it is required to obtain a correlation between the macro parameters of the plasma and the equipment parameters in order to contribute to the efficient design of processing conditions. In this study, the vibrational temperature T_v was estimated by fitting the theoretical spectrum of the CF B-X system calculated by assuming the Boltzmann distribution to the emission spectrum obtained by optical emission spectroscopy.