[15p-PA03-1~18] 12.1 Fabrications and Structure Controls

[15p-PA03-1] Growth process and structural analysis of dinaphtho[2, 3-b:2', 3'-f]thieno[3, 2-b]thiophene (DNTT) thin films

〇Nobuya Hiroshiba^1,2, Yuta Kawano^1,2, Richard Ongko^1,2, Kazuto Koike^1,2, Ryosuke Matsubara³, Atsushi Kubono³, Hirotaka Kojima⁴ (1.OIT, 2.NMRC, OIT, 3.Shizuoka Univ., 4.NIT, Maizuru)

Keywords:Thin film growth, Grazing Incident X-ray Diffraction(GIXD), MD simulation

The growth process of DNTT thin films fabricated using slow deposition was investigated experimental and theoritical analysis. The initial stages of thin film growth were analyzed using AFM, XRD, and GIXD methods. The thin film formation behaviors of DNTT molecules on amorphous SiO2 surface were also analyzed using MD simulation. These results will be systematically discussed.