2023年第70回応用物理学会春季学術講演会

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15 結晶工学 » 15.3 III-V族エピタキシャル結晶・エピタキシーの基礎

[16a-A205-1~8] 15.3 III-V族エピタキシャル結晶・エピタキシーの基礎

2023年3月16日(木) 09:30 〜 11:45 A205 (6号館)

荒井 昌和(宮崎大)、富永 依里子(広島大)

10:15 〜 10:30

[16a-A205-4] Photoluminescence Evolution of Submonolayer Nanostructures at the 2D-3D Transition

Ronel Intal Roca1、Itaru Kamiya1 (1.Toyota Tech. Inst.)

キーワード:submonolayer, InAs, self-assembly

InAs/GaAs nanostructures assembled by stacked submonolayer (SML) growth is one of the promising alternatives to the conventional Stranki-Krastanov (SK) InAs nanostructures. While recent reports have clarified the existence of a transition from 2D (layer-to-layer) to 3D growth regime, the SML transition is still not well understood. In the present report, the time evolution of the SML transition is investigated by introducing a growth interruption before GaAs capping and photoluminescence (PL) measurements. The interruption allows for the growth transition to occur and capping effectively freezes the state of the transition. By varying the interruption time, it is possible to probe the time evolution of the growth transition.