[16p-A302-1~8] Advanced Surface and Interface Technologies for Micro and Nanoscale Fabrication

[16p-A302-5] Current Status and Prospect for EUV Lithography

〇Takeo Watanabe¹, Tetsuo Harada¹, Shinji Yamakawa¹ (1.Univ. of Hyogo)

Keywords:EUV lithography, Advanced lithography, R&D of basic technology

Data centers used for various services such as smartphones, IoT, and SNS are computers centered on cloud computing. Many advanced logic and memory semiconductors are used there. The rapid progress of technological innovation in these semiconductor devices is largely due to progress in the technology of advanced lithography. Among them, the advanced technology of advanced lithography is still in demand, and the extreme ultraviolet lithography (EUVL) technology has been applied to the mass production technology for 7 nm generation logic devices since 2019. The lecture will introduce the current status, issues, and future development of EUVL technology. In addition, from the viewpoint that semiconductors are extremely important technology for the national security and economic security, I believe that it is necessary to realize the revival of semiconductors in Japan. We have discussed the scenario necessary for this revival, including the historical background.