[16p-PA09-1~18] 6.4 Thin films and New materials

[16p-PA09-18] Development of metal oxide ultra-thin film by wet process

〇Ryusei Kato¹, Takaaki Murata¹, Tetsuharu Yuge¹ (1.Mitsubishi Chemical Corp.)

Keywords:metal oxide, ultra thin film, photocatalytic

Metal oxides have various physical and chemical properties and are used in a wide range of fields. In recent years, application to electronic devices including the field of semiconductors has been actively studied, and thinning of metal oxide layers is required. Dry processes such as PVD are generally used to fabricate ultra-thin films. In this study, we developed a metal oxide ultra-thin film by a simple wet process using a metal oxide dispersion.