[17a-E502-1~13] 7.1 X線技術

▲ [17a-E502-5] Comparison of focusing optics for extreme vacuum ultraviolet and vacuum ultraviolet emission from laser produced plasma

〇Nozomi Tanaka¹、Yubo Wang¹、James Edward Hernandez¹、Katsunobu Nishihara¹、Shinsuke Fujioka¹、Atsushi Sunahara^1,2、Tomoyuki Johzaki^1,3、Kyung Sik Kang⁴、Youngduk Suh⁴、Jeong-Gil Kim⁴、Shinji Ueyama⁵、Ken Ozawa⁵ (1.ILE, Osaka Univ.、2.Purdue Univ.、3.Hiroshima Univ.、4.Samsung MR、5.Samsung DS R&D Japan)

キーワード：EUV source, EUV optics

Extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) technology offer a wide range of benefits and have a large number of practical applications across a wide variety of sectors, such as EUV-VUV imaging, EUV-VUV spectroscopy, EUV Nano-machining and so on. In laboratory scale, laser-produced plasma (LPP) is often used as EUV-VUV light source owing to the short-pulse (nanosecond), high-temperature (10-100 eV), and high-density (~10²¹ cm^-3) plasma with continuous spectrum. By collecting the radiations, material ablation associated with plasma production by intense pulsed EUV-VUV is possible, and it has many unique applications. Thus, it is important to establish effective focusing optics that can collect EUV-VUV light with high collection efficiency.
We have developed two types of EUV-VUV focusing optics, ellipsoidal focusing optics and Schwarzschild objective (SO) with SiC. Experimental and ray-trace simulation studies validated the total collection efficiency and characteristics of the focusing for each focusing optic system. The detailed results of comparison study will be presented in the talk.