[17p-B309-1~19] 17.2 Graphene

△ [17p-B309-18] Fabrication of strain-induced graphene resonant mass sensor using elastomer nanosheet

〇Motoki Kato¹, Ken Arano¹, Masato Saito², Toshinori Fujie², Yong Joon Choi¹, Toshihiko Noda¹, Kazuaki Sawada¹, Kazuhiro Takahashi¹ (1.Toyohashi Univ. Tech., 2.Tokyo Institute of Technology)

Keywords:Graphene, Resonator, fQ Product

We developed a transfer technique for a strain-induced graphene sheet by an elastomer nanosheet using polystyrene-polybutadiene-polystyrene (SBS) triblock copolymer to improve resonance characteristics of a graphene resonator. However, since SBS has not been used in semiconductor microfabrication processes, there is no knowledge of its complete removal. Therefore, we investigated etching conditions using tetrahydrofuran, a low-polarity solvent, as an etchant for SBS, and confirmed that graphene adheres to a silicon substrate using the SBS as a support film. Reflection spectrum showed air gap derived optical interference peaks, suggesting that transferred graphene was suspended on the substrate. We also demonstrated a 62% improvement in both resonance frequency and Q factor. These results indicate that strain-induced graphene resonator have been successfully fabricated using elastomer nanosheets for the first time, resulting in improvement of resonance characteristics.