The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[17p-B414-1~15] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Fri. Mar 17, 2023 1:00 PM - 5:00 PM B414 (Building No. 2)

Koichiro Saga(Sony), Nobuya Mori(Osaka Univ.), Hajime Tanaka(阪大)

1:00 PM - 1:15 PM

[17p-B414-1] Deformation and contact path of PVA brush nodule in relative motion on a flat plate

〇(M1C)Shota Suzuki1, Yuki Mizushima1, Satomi Hamada2, Ryota Koshino2, Akira Fukunaga2, Toshiyuki Sanada1 (1.Shizuoka Univ., 2.Ebara Corp)

Keywords:post-CMP cleaning, PVA brush

In this study, we focused on the transfer of liquid from the PVA brush when it contacts and deforms the surface to improve the efficiency of PVA brush cleaning used in post-CMP cleaning. In the experiment, we reproduced the relative motion of a brush rotating about a horizontal axis on a wafer rotating about a vertical axis and analyzed the brush deformation and contact trajectory during contact between the PVA brush and the wafer.