The 70th JSAP Spring Meeting 2023

Presentation information

Print

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[17p-D419-1~15] 6.4 Thin films and New materials

Fri. Mar 17, 2023 1:30 PM - 5:45 PM D419 (Building No. 11)

Yuji Muraoka(Okayama Univ.), Ryota Shimizu(Tokyo Tech)

5:00 PM - 5:15 PM

[17p-D419-13] Effects of annealing temperature on optical properties of Ni(OH)2 thin films

〇Yoshio Abe1, Midori Kawamura1, Kyung Ho Kim1, Takayuki Kiba1 (1.Kitami Inst. Tech.)

Keywords:nickel hydroxide the film, sputtering, bandgap energy

Electrochemically-active nickel hydroxide [Ni(OH)2] thin films were deposited by reactive sputtering. Bandgap energy of the Ni(OH)2 thin films was studied because previous reports on it were scarce. The bandgap energy of the Ni(OH)2thin films was found to be about 4.2 eV, and it decreased by annealing above 150 degree C due to the thermal decomposition to NiO.