[18p-A202-1~8] CS.6 Code-sharing Session of 8.3 & 9.2 & 13.6

[18p-A202-2] Damage protection from focused ion beam milling on nanowire lasers

〇Masato Takiguchi^1,2, Guoqiang Zhang^1,2, Satoshi Sasaki², Kouta Tateno^1,2, Caleb John², Masaaki Ono^1,2, Hisashi Sumikura^1,2, Akihiko Shinya^1,2, Masaya Notomi^1,2,3 (1.NTT NPC, 2.NTT BRL, 3.Tokyo Tech)

Keywords:nanowire, laser, focused ion beam

Room-temperature CW nanowire lasers [1] have not been realized because of thermal problem. Therefore, it is important to implement cavity structures into nanowires that reduce the lasing threshold. In this study, we aim to directly fabricate the cavity structure on the nanowire using a focused ion beam (FIB). Generally, it is very difficult to pattern a structure with curvature by electron beam lithography, so FIB is an effective processing method. However, the damage to the active layer caused by Ga-ions has been a big issue. Therefore, this time, in order to suppress the damage, we coated the nanowire with alumina using atomic layer deposition (ALD) as a hard mask. As a result, we succeeded in suppressing the damage by FIB processing [2].
[1] M. Notomi, et.al., Opt. Mater. Express, 10, 2560 (2020)
[2] M. Takiguchi, et.al., Nanotechnology, (2023) accepted