[3Cp] 半導体・磁気・電子・光デバイス材料・電子材料プロセス(EMP・MI・MS)

[3Cp01] Metal-insulator phase transition in ultra-thin Fe₃O₄ film grown on MgO substrate flattened by catalyst-referred etching

大坂藍¹⁾，○服部梓¹⁾，田中秀和¹⁾，藤大雪²⁾，山内和人²⁾，佐野泰久²⁾ (¹⁾阪大産研，²⁾阪大院工)