[3Cp] 半導体・磁気・電子・光デバイス材料・電子材料プロセス(EMP・MI・MS)

[3Cp05S] New etching mode of Ge surfaces in water assisted by chemically modified graphene sheets

○三栗野諒¹⁾，小笠原歩見¹⁾，平野智暉¹⁾，川合健太郎¹⁾，山村和也¹⁾，有馬健太¹⁾ (¹⁾阪大院工)