Surface Engineering/Thin Film/Semiconductor/Magnetic, Electronic, and Photonic devices/Electronic Material Processing(SE/TF/EMP/MI/MS)
Wed. Nov 3, 2021 1:30 PM - 4:45 PM Room D (Kotohira)
Chair:
1:30 PM - 1:45 PM
*Yoshihito Sano1, Kenichi Kaminaga1, Shingo Maruyama1, Yuji Matsumoto1 (1. Tohoku Univ.)
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1:45 PM - 2:00 PM
*Ikuya Matsuzawa1, Takahiro Ozawa1, Yusuke Nishiya1, Umar Sidik2, Azusa Hattori2, Hidekazu Tanaka2, Katsuyuki Fukutani1,3 (1. The University of Tokyo, 2. Osaka University, 3. Japan Atomic Energy Agency)
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2:00 PM - 2:30 PM
*Kohei Fujiwara1 (1. IMR, Tohoku University)
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2:30 PM - 3:00 PM
*keiko takase1 (1. NTT Basic Research Laboratories, NTT Corporation)
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3:00 PM - 3:15 PM
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3:15 PM - 3:30 PM
*kunio okimura1, Yuta Miyatake2, Toshihiro Nakanishi3 (1. Faculty of Engineering, Tokai University, 2. Graduate School of Engineering, Tokai University, 3. Graduate School of Engineering, Kyoto University)
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3:30 PM - 3:45 PM
*Naoto Saito1, Adriano Panepinto2, Stephanos Konstantinidis2, Ming Yang1, Tetsuhide Shimizu1 (1. Tokyo metropolitan university, 2. University of Mons)
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3:45 PM - 4:15 PM
*Hiroki Kobayashi1, Kouhei Matsuoka1, Tatsurou Tsuyuki1, Isao Kimura1, Takehito Jimbo1 (1. ULVAC Inc.)
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4:15 PM - 4:30 PM
*Tomoaki Osumi1, Yasuhito Gotoh1 (1. Graduate School of Engineering, Kyoto University)
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4:30 PM - 4:45 PM
*Eiji Kusano1 (1. Kanazawa Institute of Technology)
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