[2Ep01-04] VST

[2Ep04S] Characterization of Zr and Ti NEG films deposited by UHV sputtering

*Ryosuke Tsuchida¹, Md. Suruz Mian¹, Takeo Nakano¹, Takashi Kikuchi², Kazuhiko Mase^2,3 (1. Graduate School of Science and Technology, Seikei University, 2. KEK, 3. SOKENDAI)

Non-evaporable getter (NEG) denotes a group of materials that can be activated by heating under ultrahigh vacuum (UHV) and can pump residual gases at room temperature. Recently, single metallic Zr or Ti thin films were reported to work as NEG with activation temperature of about 200 ℃. In this study, a zirconium thin film deposited onto a sawtooth shaped substrate by sputtering method was baked at 150 ~ 200℃ for 12 ~ 24 hours under UHV. Although pumping speed for H₂ was below the detection limit, the pressure in the chamber after baking reached the range of 10^-8 Pa at room temperature, suggesting that the Zr thin film pumps H₂O and CO. We will also report the pumping properties of a titanium film deposited by sputtering method in the vacuum environment of 10^-7 Pa.