[13] マイクロ加工　　　

[13-64] Dopant Activation and Thermal Simulation in Non-melt Laser Annealing in Silicon with Near-infrared laser

速報論文

^○Koji ASAMA, Haruhiko MINAMITAKE, Hiroshi NAKAOKU, Takeshi MONODANE, Hiroshi YAMAGUCHI (三菱電機(株))

Keywords:未定