Oral Session
D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications
Wed. Dec 15, 2021 9:00 AM - 11:00 AM Room A (G401)
Chair: Akira Chikamatsu (The University of Tokyo), Kohei Fujiwara (Tohoku University, JAPAN)
9:00 AM - 9:25 AM
*Takahiko Yanagitani1,2,3 (1. Waseda University (Japan), 2. ZAIKEN (Japan), 3. JST-CREST (Japan))
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9:25 AM - 9:40 AM
*Kei Shigematsu1,2, Keita Ozawa1, Marin Katsumata1, Masaki Azuma1,2 (1. Laboratory for Materials and Structures, Tokyo Institute of Technology (Japan), 2. Kanagawa Institute of Industrial Science and Technology (Japan))
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9:40 AM - 9:55 AM
*Satoshi Sasaki1, Daichi Oka1, Kenichi Kaminaga1, Daichi Saito1, Nobuto Abe1, Hirokazu Shimizu1, Tomoteru Fukumura1 (1. Tohoku Univ. (Japan))
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9:55 AM - 10:20 AM
*Norifumi Fujimura1 (1. Osaka Prefecture University (Japan))
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10:20 AM - 10:35 AM
*Shishin Mo1, Tsukasa Katayama2, Akira Chikamatsu1, Miho Kitamura3, Koji Horiba4, Hiroshi Kumigashira5, Tetsuya Hasegawa1 (1. The Univ. of Tokyo (Japan), 2. Hokkaido Univ. (Japan), 3. High Energy Accelerator Res. Organization (Japan), 4. National Inst. for Quantum and Radiological Sci. and Tech. (Japan), 5. Tohoku Univ. (Japan))
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10:35 AM - 11:00 AM
*Hiroki Wadati1, Kohei Yamamoto2 (1. Univ. of Hyogo (Japan), 2. Inst. for Molecular Sci. (Japan))
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