*Ryoichi Mizutani¹, Shinnosuke Yasuoka¹, Takao Shimizu², Hiroshi Funakubo¹ (1. Tokyo Inst. of Tech. (Japan), 2. National inst.for Materials Sci. (Japan))

*Jun-ichi Yamaura¹ (1. Tokyo Institute of Technology (Japan))

Georg Schönweger¹, Adrian Petraru¹, Md Redwanul Islam², Niklas Wolff², Timo Rieß², Fabian Lofink³, Lorenz Kienle², Hermann Kohlstedt¹, *Simon Fichtner^2,3 (1. Institute of Electrical Engineering and Information Engineering, Kiel University, Kaiserstr. 2, D-24143 Kiel (Germany), 2. Institute for Material Science, Kiel University, Kaiserstr. 2, D-24143 Kiel (Germany), 3. Fraunhofer Institute for Silicon Technology (ISIT), Fraunhoferstr. 1, D-25524 Itzehoe (Germany))

*Laura Fumagalli¹ (1. Univ. of Manchester (UK))