*Yusaku Sato¹, Atsushi Yokoi², Wai Kian Tan², Go Kawamura¹, Hiroyuki Muto^1,2, Atsunori Matsuda¹ (1. Department of Electrical and Electronic Information Engineering, Toyohashi Univ. of Tech. (Japan), 2. Institute of Liberal Arts and Sciences, Toyohashi Univ. of Tech. (Japan))

*Takuto Sunada¹, Atsushi Yokoi¹, Wai Kian Tan¹, Go Kawamura¹, Atsunori Matsuda¹, Hiroyuki Muto¹ (1. Toyohashi University of Technology (Japan))

*Koki Nakamura¹, Atsushi Yokoi², Wai Kian Tan², Go Kawamura¹, Atsunori Matsuda¹, Hiroyuki Muto^1,2 (1. Electrical and Electronic Information Engineering, Toyohashi Univ. of Tech. (Japan), 2. Institute of Liberal Arts and Sciences, Toyohashi Univ. of Tech. (Japan))

*Saki Furukawa¹, Kota Hirasawa¹, Yuki Tsuji¹, Haruno Yanagimoto¹, Atsushi Hyono¹, Makoto Chiba¹, Hideaki Takahashi¹ (1. National Institute of Technology, Asahikawa college (Japan))

*Rin Takada¹, Mitsuki Kawamura¹, Kota Hirasawa¹, Yuki Tsuji¹, Yumino Tomioka¹, Atsushi Hyono¹, Makoto Chiba¹, Hideaki Takahashi¹ (1. National Institute of Technology, Asahikawa college (Japan))

*Hiromi Tanaka¹, Ryo Matsumoto², Sayaka Yamamoto², Hiroyuki Muto³, Yoshihiko Takano² (1. Natl. Inst. Tech., Yonago Coll. (Japan), 2. Natl. Inst. Mat. Sci. (Japan), 3. Toyohashi Univ. Tech. (Japan))

*Hitomi Yano¹, Akihisa Aimi¹, Kenjiro Fujimoto¹ (1. Tokyo Univ. of Sci. (Japan))

*Gosuke Takano¹, Yamato Hayashi¹, Jun Fukushima¹, Hirotsugu Takizawa¹ (1. Tohoku Univ. (Japan))

*Yuri Taniguchi¹, Hiroya Ogawa¹, Wai Kian Tan¹, Hiroyuki Muto¹, Atsunori Matsuda¹, Go Kawamura¹ (1. Toyohashi Univ. of Tech. (Japan))

*Kaito Oshio¹, Takeshi Toyama¹, Kosuke Sugawa¹, Tomohiro Shimizu², Kouichi Takase¹ (1. Nihon Univ (Japan), 2. Kansai Univ (Japan))

*Kento Ishii¹, Shogo Miyoshi¹, Machiko Ode¹, Kazutaka Mitsuishi¹, Takahisa Ohno¹, Kazunori Takada¹, Tetsuo Uchikoshi¹ (1. National Institute for Materials Science (Japan))

*Yusaku Sato¹, Atsushi Yokoi², Wai Kian Tan², Go Kawamura¹, Hiroyuki Muto^1,2, Atsunori Matsuda¹ (1. Department of Electrical and Electronic Information Engineering, Toyohashi Univ. of Tech. (Japan), 2. Institute of Liberal Arts and Sciences, Toyohashi Univ. of Tech. (Japan))

*Takuto Sunada¹, Atsushi Yokoi¹, Wai Kian Tan¹, Go Kawamura¹, Atsunori Matsuda¹, Hiroyuki Muto¹ (1. Toyohashi University of Technology (Japan))

*Koki Nakamura¹, Atsushi Yokoi², Wai Kian Tan², Go Kawamura¹, Atsunori Matsuda¹, Hiroyuki Muto^1,2 (1. Electrical and Electronic Information Engineering, Toyohashi Univ. of Tech. (Japan), 2. Institute of Liberal Arts and Sciences, Toyohashi Univ. of Tech. (Japan))

*Saki Furukawa¹, Kota Hirasawa¹, Yuki Tsuji¹, Haruno Yanagimoto¹, Atsushi Hyono¹, Makoto Chiba¹, Hideaki Takahashi¹ (1. National Institute of Technology, Asahikawa college (Japan))

*Rin Takada¹, Mitsuki Kawamura¹, Kota Hirasawa¹, Yuki Tsuji¹, Yumino Tomioka¹, Atsushi Hyono¹, Makoto Chiba¹, Hideaki Takahashi¹ (1. National Institute of Technology, Asahikawa college (Japan))

*Hiromi Tanaka¹, Ryo Matsumoto², Sayaka Yamamoto², Hiroyuki Muto³, Yoshihiko Takano² (1. Natl. Inst. Tech., Yonago Coll. (Japan), 2. Natl. Inst. Mat. Sci. (Japan), 3. Toyohashi Univ. Tech. (Japan))

*Hitomi Yano¹, Akihisa Aimi¹, Kenjiro Fujimoto¹ (1. Tokyo Univ. of Sci. (Japan))

*Gosuke Takano¹, Yamato Hayashi¹, Jun Fukushima¹, Hirotsugu Takizawa¹ (1. Tohoku Univ. (Japan))

*Yuri Taniguchi¹, Hiroya Ogawa¹, Wai Kian Tan¹, Hiroyuki Muto¹, Atsunori Matsuda¹, Go Kawamura¹ (1. Toyohashi Univ. of Tech. (Japan))

*Kaito Oshio¹, Takeshi Toyama¹, Kosuke Sugawa¹, Tomohiro Shimizu², Kouichi Takase¹ (1. Nihon Univ (Japan), 2. Kansai Univ (Japan))

*Kento Ishii¹, Shogo Miyoshi¹, Machiko Ode¹, Kazutaka Mitsuishi¹, Takahisa Ohno¹, Kazunori Takada¹, Tetsuo Uchikoshi¹ (1. National Institute for Materials Science (Japan))

*Dongfeng Xue¹ (1. Multiscale Crystal Materials Research Center, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055 (China))

*Kei Noda¹ (1. Keio Univ. (Japan))

*Zainovia Lockman¹, Nurhaswani Alias¹, Siti Azlina Rosli^1,2, Norain Isa³, Wai Kian Tan⁴, Go Kawamura⁵, Atsunori Matsuda⁵ (1. Universiti Sains Malaysia (Malaysia), 2. Faculty of Applied Sciences, Universiti Teknologi MARA (Malaysia), 3. Faculty of Chemical Engineering, Universiti Teknologi MARA (Malaysia), 4. Institute of Liberal Arts and Sciences, Toyohashi University of Technology (Japan), 5. Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology (Japan))

*Naoki Kondo¹, Akihiro Shimamura¹, Mikinori Hotta¹, Hiroki Shimizu^1,2, Toru Ujihara², Yoshihiro Ohnishi³ (1. AIST (Japan), 2. Nagoya Univ. (Japan), 3. Furukawa Denshi Co. Ltd. (Japan))

*Kazuyoshi Sato¹, Yoshiki Inaba¹, Naokatsu Kannari¹, Hiroya Abe², Anna Sciazko³, Naoki Shikazono³ (1. Gunma Univ. (Japan), 2. Osaka Univ. (Japan), 3. The Univ. of Tokyo (Japan))

*Teruaki Fuchigami¹, Hayato Yamamoto¹, Naoto Tanibata¹, Masanobu Nakayama¹, Ken-ichi Kakimoto¹ (1. Nagoya Institute of Tech. (Japan))

*Yamato Hayashi¹ (1. Tohoku Univ. (Japan))

Ngan T. K. Nguyen¹, *Tetsuo Uchikoshi^1,2,3, Sheri Matsuyama^1,3, Takamasa Ishigaki³, Hiroshi Fudouzi¹ (1. National Inst. for Materials Sci. (Japan), 2. Hokkaido Univ. (Japan), 3. Hosei Univ. (Japan))

*Emilie Pouget¹, Jie Gao¹, Wenbing Wu², Vincent Lemaire², Alain Carvalho³, Sylvain Nlate¹, Thierry Buffeteau¹, Reiko Oda¹, Yann Battie³, Matthias Pauly² (1. Bordeaux University (France), 2. Strasbourg University (France), 3. Lorraine University (France))

*Jennifer Lewis Lewis¹ (1. Harvard University (United States of America))

*Tohru S. Suzuki¹, Shota Azuma¹, Tetsuo Uchikoshi¹, Katsumi Yoshida² (1. National Institute for Materials Science (Japan), 2. Tokyo Institute of Techology (Japan))

*Fabien GRASSET^1,2,4, Ngan T.K. N.T.K. NGUYEN^1,2, Quentin KIRSCHER³, Clement LEBASTARD^1,4, Maxence WILMET^1,4,5, Vanessa PROUST¹, Adèle RENAUD⁴, Noee DUMAIT⁴, Kaplan KIRACKI⁶, Kamil LANG⁶, Dominique BERLING³, Olivier SOPPERA³, Stéphane CORDIER⁴, Jeremie TESSEIRE⁵, Naoki OHASHI^1,2, Tetsuo UCHIKOSHI^1,2 (1. IRL3629 LINK (Japan), 2. Research Center for Functional Materials, NIMS (Japan), 3. UMR7361 IS2M (France), 4. UMR6226 ISCR (France), 5. SGR Paris (France), 6. Institute of Inorganic Chemistry of the Czech Academy of Sciences (Czech Republic))

*Makoto Kondo¹, Kenji Tateishi², Shohei Saito², Seizo Obata², Osamu Sakurada¹ (1. Gifu Univ. (Japan), 2. Gifu Pref. Ceram. Res. Inst. (Japan))

*Sawao Honda¹, Ryosuke Kubota¹, Yusuke Daiko¹, Shinobu Hashimoto¹, Yuji Iwamoto¹ (1. Nagoya Inst. of Tech. (Japan))

*Swee Yong Pung¹, Sock Kuan Soo¹, Anh Thi Le¹, May Zin Toe¹ (1. Universiti Sains Malaysia (Malaysia))

*Clement Lebastard¹ (1. Institut des Sciences Chimiques de Rennes (France))

*Nowshad Amin¹, kazi Sajedur Rahman², Camellia Doroody ¹, Hasrul Nisham Rosly¹, Muhammad Najib Harif¹ (1. Univ. Tenaga Nasional (Malaysia), 2. Univ. Kebangsaan Malaysia (Malaysia))

*Jerzy P Lukaszewicz¹ (1. Nicolaus Copernicus University (Poland))

*M. Abd Elkodous¹, G. Kawamura¹, W. K. Tan¹, A. Matsuda¹ (1. Toyohashi Univ. of Tech. (Japan))

*Koshiro Suzuki¹, Yuki Tsuji¹, Mitsuki Kawamura¹, Takahito Hoshi¹, Atsushi Hyono¹, Makoto Chiba¹, Hideaki Takahashi¹ (1. National Institute of Technology, Asahikawa College (Japan))

*Sung Ting Sam^1,2, Pei Gie Gan^1,2, M.F. Abdullah¹, Mohd Firdaus Omar^1,2, Wai Kian Tan³ (1. Faculty of Chemical Engineering Tech., Univ. Malaysia Perlis (UniMAP), Kompleks Pusat Pengajian Jejawi 3, 02600 Arau, Perlis, Malaysia (Malaysia), 2. Center of Excellence Geopolymer and Green Tech., Univ. Malaysia Perlis (UniMAP), 01000, P.O. Box 77, D/A Pejabat Pos Besar, Kangar, Perlis, Malaysia (Malaysia), 3. Inst. of Liberal Arts and Sciences, Toyohashi Univ. of Tech., Toyohashi, Aichi 441-8580, Japan (Japan))