Phase Transition Behavior and Ferroelectric Property of Chemical Solution Deposition-Derived HfO<sub>2</sub>-ZrO<sub>2</sub> Thin Films

Presentation information

Oral Session

B. Fundamentals of Novel Structure of Materials » [B-4] Recent development of novel ferroelectric materials, from fundamentals to applications

Mon. Dec 13, 2021 9:00 AM - 11:00 AM Room N (G314+315)

Chair: Alexei Gruverman (University of Nebraska-Lincon), Hiroshi Funakubo (Tokyo Institute of Technology)

10:00 AM - 10:15 AM

*Ryohei Okamoto¹, Hiroshi Funakubo², Hiroshi Uchida¹ (1. Sophia Univ. (Japan), 2. Tokyo Tech. (Japan))

Keywords:Ferroelectrics, Hafnium dioxide, Zirconium dioxide, Thin Film, Chemical solution deposition

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