Significantly improved electrical conduction of Sb square net in anti-ThCr2Si2 type La2O2Sb thin films grown by multilayer solid-phase epitaxy

Yuki Yamamoto

Presentation information

Oral Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-O2] Slot 02

Mon. Dec 13, 2021 1:30 PM - 5:00 PM Room A (G401)

Chair: Andreas Klein (Technische Universität Darmstadt), Junjun Jia (Waseda University, JAPAN)

4:45 PM - 5:00 PM

[D2-O2-09] Significantly improved electrical conduction of Sb square net in anti-ThCr₂Si₂ type La₂O₂Sb thin films grown by multilayer solid-phase epitaxy

*Yuki Yamamoto¹, Hideyuki Kawasoko¹, Tomoteru Fukumura^1,2 (1. Department of Chemistry, Graduate School of Science, Tohoku University (Japan), 2. Advanced Institute for Materials Research (WPI-AIMR) and Core Research Cluster, Tohoku University (Japan))

Keywords:Solid-phase epitaxy, Sb square net, Narrow gap semiconductor

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Presentation information

[D2-O2] Slot 02

[D2-O2-09] Significantly improved electrical conduction of Sb square net in anti-ThCr2Si2 type La2O2Sb thin films grown by multilayer solid-phase epitaxy

[D2-O2-09] Significantly improved electrical conduction of Sb square net in anti-ThCr₂Si₂ type La₂O₂Sb thin films grown by multilayer solid-phase epitaxy