Significantly improved electrical conduction of Sb square net in anti-ThCr2Si2 type La2O2Sb thin films grown by multilayer solid-phase epitaxy

Yuki Yamamoto

講演情報

Oral Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-O2] Slot 02

2021年12月13日(月) 13:30 〜 17:00 Room A (G401)

Chair: Andreas Klein (Technische Universität Darmstadt), Junjun Jia (Waseda University, JAPAN)

16:45 〜 17:00

[D2-O2-09] Significantly improved electrical conduction of Sb square net in anti-ThCr₂Si₂ type La₂O₂Sb thin films grown by multilayer solid-phase epitaxy

*Yuki Yamamoto¹, Hideyuki Kawasoko¹, Tomoteru Fukumura^1,2 (1. Department of Chemistry, Graduate School of Science, Tohoku University (Japan), 2. Advanced Institute for Materials Research (WPI-AIMR) and Core Research Cluster, Tohoku University (Japan))

キーワード：Solid-phase epitaxy, Sb square net, Narrow gap semiconductor

要旨・抄録、PDFの閲覧には参加者用アカウントでのログインが必要です。参加者ログイン後に閲覧・ダウンロードできます。
» 参加者用ログイン

講演情報

[D2-O2] Slot 02

[D2-O2-09] Significantly improved electrical conduction of Sb square net in anti-ThCr2Si2 type La2O2Sb thin films grown by multilayer solid-phase epitaxy

[D2-O2-09] Significantly improved electrical conduction of Sb square net in anti-ThCr₂Si₂ type La₂O₂Sb thin films grown by multilayer solid-phase epitaxy