Epitaxial Growth of <em>p</em>-Type SnO Films and Soft Chemical Sulfurization

Suguri Uchida

講演情報

Oral Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-O3] Slot 03

2021年12月14日(火) 09:00 〜 11:00 Room A (G401)

Chair: Naoomi Yamada (Department of Applied Chemistry, Chubu University), Naoka NAGAMURA (National Institute for Materials Science, JAPAN)

09:25 〜 09:40

[D2-O3-02] Epitaxial Growth of p-Type SnO Films and Soft Chemical Sulfurization

*Suguri Uchida¹, Takuto Soma¹, Akira Ohtomo¹ (1. Tokyo Inst. of Tech. (Japan))

キーワード：p-Type semiconductor, Transparent conducting oxide, Pulsed-laser deposition, Soft chemistry

要旨・抄録、PDFの閲覧には参加者用アカウントでのログインが必要です。参加者ログイン後に閲覧・ダウンロードできます。
» 参加者用ログイン