Materials Research Meeting 2021

Presentation information

Print

Oral Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-O6] Slot 06

Wed. Dec 15, 2021 9:00 AM - 11:00 AM Room A (G401)

Chair: Akira Chikamatsu (The University of Tokyo), Kohei Fujiwara (Tohoku University, JAPAN)

9:55 AM - 10:20 AM

[D2-O6-04 (Symposium Invited)] Why do the HfO2-based ferroelectric thin films show unique properties? - Negative Capacitance, Wake-up Process and Time-dependent Imprint -

*Norifumi Fujimura1 (1. Osaka Prefecture University (Japan))

Keywords:HfO2, Ferroelectrics, negative capacitance, Wake-up, imprint

Please log in with your participant account.
» Participant Log In