[D2-PR14] Slot 14

[D2-PR14-20] Density and thermal conductivity of amorphous Al₂O₃ films deposited by rf magnetron sputtering under the total gas pressure from 0.5 to 8.0 Pa

*Naoki Noda¹, Chinami Abe¹, Makoto Kashiwagi^1,2, Yuichiro Yamashita^1,3, Takashi Yagi^1,3, Junjun Jia⁴, Naoyuki Taketoshi^1,3, Yuki Oguchi¹, Yuzo Shigesato¹ (1. Aoyama Gakuin Univ. (Japan), 2. Japan Science and Technology Agency (Japan), 3. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 4. Waseda Univ. (Japan))

Keywords:thermal conductivity, density, amorphous, thin film, Al2O3, rf magnetron sputtering