[D2-PR14] Slot 14

[D2-PR14-20] Density and thermal conductivity of amorphous Al₂O₃ films deposited by rf magnetron sputtering under the total gas pressure from 0.5 to 8.0 Pa

*Naoki Noda¹, Chinami Abe¹, Makoto Kashiwagi^1,2, Yuichiro Yamashita^1,3, Takashi Yagi^1,3, Junjun Jia⁴, Naoyuki Taketoshi^1,3, Yuki Oguchi¹, Yuzo Shigesato¹ (1. Aoyama Gakuin Univ. (Japan), 2. Japan Science and Technology Agency (Japan), 3. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 4. Waseda Univ. (Japan))

キーワード：thermal conductivity, density, amorphous, thin film, Al2O3, rf magnetron sputtering