Materials Research Meeting 2021

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Poster Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-PR14] Slot 14

Tue. Dec 14, 2021 4:00 PM - 6:00 PM D2-PR14 (G403-404)

4:00 PM - 6:00 PM

[D2-PR14-24] n-type and p-type SnOx thin films deposited by reactive sputtering

*Yoonjin Kim1, Takumi Sugane1, Junjun Jia2, Makoto Kashiwagi1, Yuki Oguchi1, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. Waseda Univ. (Japan))

Keywords:tin oxide (SnOx), tin monoxide (SnO), p-type semiconductor, n-type semiconductor, reactive sputtering

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